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CSPCL Nanhai petrochemicals complex
|Partners||CNOOC Petrochemicals Investment Limited (50%)
Shell Nanhai BV (50%)
|Cost of project||USD 4.1 billion|
|Milestones||Signing of JV - 28 October, 2000 (Beijing)
Signing of local contracts - 29 October, 2000 (Huizhou)
Final investment decision - 1 November, 2002
First pile in the ground - 12 May, 2003
Construction completion achieved - 31 December, 2005
Start-up achieved Q1 2006
|Location||Dayawan Petrochemical Industrial Park, Huizhou
People's Republic of China
|Site area||2.6 km2|
|Staff strength||1,200 of which 95% People's Republic of China citizens|
|Plant facilities and capacities||
Ethylene - 950,000 tonnes per annum (tpa)
|Feedstock||Condensate and naphtha - 1/3 from co-located CNOOC Refinery; 2/3 from onshore and offshore suppliers.|
|Environmental and social highlights||
Some 90% of liquid and solid waste is recycled or re-used for power generation.
Some 8,000 people have been resettled in two newly-built villages complete with schools and infrastructure.
By 2009, 2410 resettled villagers had attended at least one CSPCL-sponsored training programme aimed at equipping them with new skills for employment.
Contractors are encouraged to employ resettled villagers. On average, 330 resettled villagers were employed during the project construction phase. Since startup, there are still around 100 resettled villagers working for CSPCL and its contractors.
In total, 4,000 students and teachers from local schools, and 2,000 local government officials, have attended the CSPCL Open Day program. CSPCL has sponsored the tuition fees for over 500 primary and middle school students from resettled families with financial needs since 2004. From 2006 to 2009, CSPCL provided financial assistance to 70 students who were admitted into college. These students were from families with financial difficulties in the resettled villages. In 2009, CSPCL launched the 'Tomorrow' Scholarship, which will be awarded to 200 Huizhou middle and high school students of good character with good academic performance.